DIE PHOTOELEKTRONENSPEKTROSKOPIE UND DER UEBERGANG VOM FREIEN ATOM ZUM FESTKOERPER. = LA SPECTROSCOPIE DE PHOTOELECTRONS ET LE PASSAGE DE L'ATOME LIBRE AU CORPS SOLIDEFINSTER J.1976; WISSENSCH. Z. KARL-MARX-UNIV. LEIPZIG, MATH.-NATURWISSENSCH. REIHE; DTSCH.; DA. 1976; VOL. 25; NO 4; PP. 449-466; BIBL. 1 P.Article

PHOTOELECTRON INTENSITY SPECTROSCOPY. ANALYTICAL AND STRUCTURAL INFORMATION FROM PEIS APPLIED TO ZEOLITES.FINSTER J; LORENZ P.1977; CHEM. PHYS. LETTERS; NETHERL.; DA. 1977; VOL. 50; NO 2; PP. 223-227; BIBL. 10 REF.Article

DIE WECHSELWIRKUNG ZWISCHEN TRAEGEROBERFLAECHE UND PLATIN-VERBINDUNGEN BEI DER KATALYSATORHERSTELLUNG = INTERACTIONS ENTRE SURFACE DU SUPPORT ET COMPOSES DU PLATINE LORS DE LA PREPARATION DU CATALYSEURCZARAN E; FINSTER J; SCHNABEL KH et al.1978; Z. ANORG. ALLG. CHEM.; DDR; DA. 1978; VOL. 443; NO 6; PP. 175-184; ABS. ENG; BIBL. 9 REF.Article

XPS STUDIES OF SIO₂ SURFACE LAYERS FORMED BY OXYGEN ION IMPLANTATION INTO SILICONSCHULZE D; FINSTER J; HENSEL E et al.1983; PHYSICA STATUS SOLIDI. (A). APPLIED RESEARCH; ISSN 0031-8965; DDR; DA. 1983; VOL. 76; NO 1; PP. K21-K24; BIBL. 9 REF.Article

INTERPRETATION OF GHOST LINES IN SECONDARY-ELECTRON SPECTRA DETERMINED BY XPS = INTERPRETATION DES RAIES FANTOMES DANS LES SPECTRES D'ELECTRONS SECONDAIRES DETERMINES PAR XPSGURKER N; EBEL H; ZEINER K et al.1982; J. ELECTRON SPECTROSC. RELAT. PHENOM.; ISSN 0368-2048; NLD; DA. 1982; VOL. 25; NO 2-3; PP. 219-229; BIBL. 10 REF.Article

ESCA INVESTIGATIONS OF SOME NIO/SIO₂ AND NIO-AL₂O₃/SIO₂ CATALYSTSLORENZ P; FINSTER J; WENDT G et al.1979; J. ELECTRON SPECTROSC. RELAT. PHENOMENA; NLD; DA. 1979; VOL. 16; NO 4; PP. 267-276; BIBL. 16 REF.Article

Orientation-dependent surface core-level shifts and chemical shifts on clean and H₂S-covered GaAsRANKE, W; FINSTER, J; KUHR, H. J et al.Surface science. 1987, Vol 187, Num 1, pp 112-132, issn 0039-6028Article

Orientation and temperature dependent adsorption of H₂S on GaAs: valence band photoemissionRANKE, W; KUHR, H. J; FINSTER, J et al.Surface science. 1987, Vol 192, Num 1, pp 81-94, issn 0039-6028Article

Chemical etching and polishing of InPKURTH, E; REIF, A; GOTTSCHALCH, V et al.Crystal research and technology (1979). 1988, Vol 23, Num 1, pp 117-126, issn 0232-1300Article

Studies on nickel oxide mixed catalysts. XII: Characterization of NiO/Al₂O₃-SiO₂ catalystsWENDT, G; HENTSCHEL, D; FINSTER, J et al.Journal of the Chemical Society. Faraday Transactions I. 1983, Vol 79, Num 9, pp 2013-2025, issn 0300-9599Article

ESCA and SEXAFS investigations of insulating materials for ULSI microelectronicsFINSTER, J; KLINKENBERG, E.-D; HEEG, J et al.Vacuum. 1990, Vol 41, Num 7-9, pp 1586-1589, issn 0042-207XConference Paper

Investigating the antiproliferative activity of quinoline-5,8-diones and styrylquinolinecarboxylic acids on tumor cell linesPODESZWA, B; NIEDBALA, H; MOL, W et al.Bioorganic & medicinal chemistry letters (Print). 2007, Vol 17, Num 22, pp 6138-6141, issn 0960-894X, 4 p.Article